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Projection mask lithography: Page 1 of 1

Process Hierarchy

  • Bonding
  • Clean
  • Consulting
  • Deposition
  • Doping
  • Etch
  • LIGA
  • Lift off
  • Lithography
  • Contact mask lithography
  • Maskless lithography
  • Miscellaneous lithography
  • Projection mask lithography
  • Mask making
  • Metrology
  • Miscellaneous
  • Packaging
  • Polishing
  • Process technologies
  • Thermal
  • Unique capabilities
Projection mask lithography
The image on the mask is projected on to the substrate through a system of optical lenses to properly collimate the light for better feature resolution. Most projection mask systems use a reduction factor (ie. 5 or 10), which means the projected image on the substrate is smaller (by that factor) than the image on the mask.
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Process
5X i-line photolithography (image reversal)
5x i-line stepper photolithography
4X Projection photolithography
10X G-line photolithography (OCG 825 35CS)
10X G-line photolithography (Shipley SPR 220-7)
5X DUV photolithography
5X DUV photolithography (with BARC)
5X I-line photolithography (OiR 897 10i)
5X i-line photolithography (Automated)
5x i-line step & expose
4X DUV photolithography (SVGL Micrascan III)
4X DUV (193nm) photolithography
Step/repeat projection
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