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4X DUV photolithography (SVGL Micrascan III): View
Process Hierarchy
Bonding
Clean
Consulting
Deposition
Doping
Etch
LIGA
Lift off
Lithography
   Contact mask lithography
   Maskless lithography
   Miscellaneous lithography
   Projection mask lithography
Mask making
Metrology
Miscellaneous
Packaging
Polishing
Process technologies
Thermal
Unique capabilities

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368

on front
4X DUV photolithography (SVGL Micrascan III)
Batch size 1
Batch sizes 150 mm: 12, 200 mm: 12
Magnification 4
Min feature size 0.25 µm
Sides processed either
Wafer size
Wafer size
Equipment