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Nickel LIGA (fully anchored structures) (Type 2 mold insert): View
Process Hierarchy
Bonding
Clean
Consulting
Deposition
Doping
Etch
LIGA
Lift off
Lithography
Mask making
Metrology
Miscellaneous
Packaging
Polishing
Process technologies
Thermal
Unique capabilities
   DUV Lithography
   Deep boron diffusion
   Hot Embossing
   LIGA
   Maskless lithography
   Microwave bonding
   Shape memory alloy deposition
   Silicon-germanium processes
   Supercritical dry
   Xenon difluoride etch

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368

Nickel LIGA (fully anchored structures) (Type 2 mold insert)
Process characteristics:
Nickel thickness
Nickel thickness*
must be 20 .. 500 µm
20 .. 500 µm
Aspect ratio 10
Batch size 1
Mold height uniformity 5 µm
Mold sidewall roughness 50 nm
Smallest feature size 20 µm
Wafer diameter(s)
List or range of wafer diameters the tool can accept
123.825 mm
Wafer thickness
List or range of wafer thicknesses the tool can accept
0.25 inch
Wafer size
Wafer size
Comments:
  • The layout will be reviewed by Mezzo Systems.
  • The effective pattern area is 3.5inch in diameter.
  • The wafer is provided by Mezzo Systems.
  • The standard aspect ratio for the mold inserts used in hot embossing is 7. Please contact Mezzo Systems for higher aspect ratios.
  • Defect criteria < 3 defects/inch2 at 5um size.
  • The estimated lead time is for this process 8-10 weeks.