| RCA clean |
| 4:1 Sulfuric/peroxide bath |
| 50:1 HF dip |
| 9:1 Sulfuric/peroxide bath |
| Clean (metal) |
| HCl bath |
| Organic NMP-clean |
| Pre-furnace clean (for metallized wafers with DUV photoresist) |
| Pre-furnace clean (for metallized wafers) |
| HF dip |
| Piranha clean |
| RCA clean |
| Solvent clean (acetone +IPA) |
| Supercritical CO2 Dry |
| BOE/BHF clean |
| Clean |
| HF clean |
| HF dip |
| Ionic clean |
| Organic clean |
