on front Spectroscopic Ellipsometric Multi-Point Film Thickness Measurement |
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| Batch size |
1 |
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| Film thickness |
0.01 .. 2 µm |
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| Materials |
PZT, aluminum nitride, silicon nitride on silicon, silicon dioxide on silicon |
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| Refractive index |
1 .. 4 |
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| Sides processed |
either |
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| Wafer size |
|
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| Equipment |
Woollam Spectroscopic Ellipsometer |
| Equipment characteristics: |
| Piece dimension Range of wafer piece dimensions the equipment can accept |
50 .. 150 mm |
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| Piece geometry Geometry of wafer pieces the equipment can accept |
circular, irregular, other, rectangular |
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| Piece thickness Range of wafer piece thickness the equipment can accept |
200 .. 700 µm |
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| Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
silicon, silicon on insulator |
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