logo
Linewidth Microscope Measurement: View
Process Hierarchy
Bonding
Clean
Consulting
Deposition
Doping
Etch
LIGA
Lift off
Lithography
Mask making
Metrology
   Electrical metrology
   Geometric metrology
   Miscellaneous metrology
Miscellaneous
Packaging
Polishing
Process technologies
Thermal
Unique capabilities

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368

Linewidth Microscope Measurement
Line width 1 .. 40 µm
Magnifications 2.5, 10, 20, 50, 100
Materials photoresist on silicon, photoresist on silicon dioxide, photoresist on silicon nitride, PMMA, silicon carbide, silicon dioxide, silicon nitride on silicon, silicon nitride on silicon dioxide
Wafer size
Wafer size
Equipment Leitz Ergolux Microscope
Equipment characteristics:
Batch sizes 100 mm: 1, 150 mm: 1, 50 mm: 1, 75 mm: 1
Piece geometry
Geometry of wafer pieces the equipment can accept
circular, irregular, other, rectangular, triangular shard
Wafer geometry
Types of wafers this equipment can accept
1-flat, 2-flat, no-flat, notched
Wafer holder
Device that holds the wafers during processing.
metal chuck
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
gallium arsenide, gallium phosphide, indium phosphide, Pyrex (Corning 7740), quartz (fused silica), quartz (single crystal), sapphire, silicon, silicon carbide, silicon on insulator