1X LPG L625 mask: View

MEMS and Nanotechnology Exchange

Register or Sign in

Process Hierarchy
Bonding
Clean
Consulting
Deposition
Doping
Etch
LIGA
Lift off
Lithography
Mask making
Metrology
Miscellaneous
Packaging
Polishing
Process technologies
Thermal
Unique capabilities

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368

1X LPG L625 mask

Process characteristics:

Mask material

Mask plate dimension

Size of mask plate to be made

Batch size

1

Critical dimension tolerance

0.25 µm

Defect density

Density (by area) of defects of a given size (e.g., 1dpsi@1.0um).

0 > 5.0um

Magnification

1

Mask coating

Mask coating material (eg. chrome).

chromium

Min feature size

2 µm

Equipment

Comments:

7x7" quartz mask is 0.15" thick.
2um minimum line feature. No circles, rings, squares smaller than 3um.