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Pre-LPCVD clean: View
Process Hierarchy
Bonding
Clean
Consulting
Deposition
Doping
Etch
LIGA
Lift off
Lithography
Mask making
Metrology
Miscellaneous
Packaging
Polishing
Process technologies
Thermal
Unique capabilities
  Pre-LPCVD clean
  2 HCl bath
Wafer size
Wafer size
Comments:
  • No metals or silicides on wafer
  • First step (piranha clean) only applies to wafers with resist or just scribed.
  • Doesn't etch Si or Si3N4.