4X E-beam XLS reticle mask: View

4X E-beam XLS reticle mask

Batch size

Critical dimension tolerance

0.1 µm

Defect density

Density (by area) of defects of a given size (e.g., 1dpsi@1.0um).

1dpsi@1.5um (MI)

Magnification

Mask coating

Mask coating material (eg. chrome).

chromium

Mask material

quartz (fused silica)

Mask plate dimension

5x5x0.09"

Min feature size

1 µm

Equipment

Comments:

CD tolerance on <2um CD is 0.1um.
Price includes 90 min of
writing time. Excess writing
time will be charged at $15
per min, not to exceed 1X base price.