Pattern Generation - Emulsion - 10x |
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| Feature geometry Shape of feature with dimensions characterized by the minimum feature size |
equal line space |
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| Magnification |
10 |
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| Max aperture size Size of pattern generator's maximum aperture (e.g., 1 mm) |
950.0 um |
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| Max flash count Maximum number of flashes allowed per mask. |
100000 |
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| Min aperture size Size of pattern generator's minimum aperture (e.g., 2 um) |
2.0 um |
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| Min feature size |
2 µm |
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| Equipment |
GCA 3600F PG |
| Equipment characteristics: |
| File formats List of CAD file formats supported (eg. GDSII, CIF) |
cif |
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| Mask coatings Mask coating materials (eg. chrome). |
chromium, emulsion |
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| Mask plate dimensions Width, length, thickness of the mask plates (eg. 5x7x0.09 inch). |
5x5x.09 inch, 7x7x.09 inch |
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| Mask polarity Polarity of the mask. |
either |
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| Max field size |
150 mm |
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| Comments: |
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MEMS and Nanotechnology Exchange