Process Hierarchy

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368
on front
  POCl3 diffusion
  1 Piranha/HF clean
  1.1 Piranha clean (MOS-clean)
  1.2 10:1 HF dip
  2 POCl3 diffusion
on front
  3 Sheet resistance measurement
Batch sizes 100 mm: 24, 150 mm: 12
Excluded materials gold
Process both sides no
Wafer size
Wafer size