Process Hierarchy

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368
  E-beam Lithography
Batch sizes 100 mm: 1, 50 mm: 1, 75 mm: 1
Min feature size 20 .. 80 nm
Resist thickness 0.4 .. 1.5 µm
Wafer size
Wafer size