Process Hierarchy

  Linewidth Microscope Measurement
Line width 1 .. 40 µm
Magnifications 2.5, 10, 20, 50, 100
Materials photoresist on silicon, photoresist on silicon dioxide, photoresist on silicon nitride, PMMA, silicon carbide, silicon dioxide, silicon nitride on silicon, silicon nitride on silicon dioxide
Wafer size
Wafer size
Equipment Leitz Ergolux Microscope
Equipment characteristics:
Batch sizes 100 mm: 1, 150 mm: 1, 50 mm: 1, 75 mm: 1
Piece geometry
Geometry of wafer pieces the equipment can accept
circular, irregular, other, rectangular, triangular shard
Wafer geometry
Types of wafers this equipment can accept
1-flat, 2-flat, no-flat, notched
Wafer holder
Device that holds the wafers during processing.
metal chuck
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
gallium arsenide, gallium phosphide, indium phosphide, Pyrex (Corning 7740), quartz (fused silica), quartz (single crystal), sapphire, silicon, silicon carbide, silicon on insulator