Process Hierarchy

  Ellipsometric Film Thickness Measurement
Film thickness 0.01 .. 2 µm
Materials silicon nitride on silicon, silicon dioxide on silicon
Refractive index 1 .. 4
Wafer size
Wafer size
Equipment Rudolph ellipsometer
Equipment characteristics:
Batch sizes 100 .. 150 mm: 1
MOS clean yes
Wafer geometry
Types of wafers this equipment can accept
1-flat, 2-flat, notched, no-flat
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
silicon on insulator, silicon
Wafer thickness
List or range of wafer thicknesses the tool can accept
300 .. 900 µm