Process Hierarchy

on front
  Aluminum plasma etch
on front
  1 Aluminum plasma etch
Materialaluminum
Materialphotoresist (category)
Process characteristics:
Depth
Depth of material removed by etch process
Depth*
Depth of material removed by etch process, must be 0 .. 2 µm
0 .. 2 µm
Material aluminum
Selectivity
Primary material removal rate divided by removal rates of secondary materials (i.e., factors by which primary material is removed faster than secondary materials)
aluminum: 1, photoresist (category): 1.5, silicon dioxide: 6
Wafer size
Wafer size
Comments:
  • If Chamber D of P5000 not available, manual passivation/strip procedure must be performed.