Process Hierarchy

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368
  Piranha clean
Process characteristics:
Etchant
Specify preferred Piranha clean solution (if known).
Etchant
Specify preferred Piranha clean solution (if known).
Process duration
Specify preferred cleaning time (if known).
Process duration
Specify preferred cleaning time (if known).
unconstrained
Temperature
Preferred cleaning temperature (if known).
Temperature
Preferred cleaning temperature (if known).
unconstrained
Sides processed both
Equipment
Comments:
  • A wet chemical solution containing sulphuric acid and hydrogen peroxide, used primarily to clean substrates for organic contamination.