Process Hierarchy

on front
  Sheet resistance measurement
Batch size 1
Current 1e-06 .. 0.2 A
Materials metal (category), silicon (doped)
Process duration 5 min
Sheet resistance 0.005 .. 5e+06 Ω/square
Sides processed either
Voltage 1e-06 .. 1 V
Wafer size
Wafer size
Equipment OmniMap Prometrix
Equipment characteristics:
Wafer holder
Device that holds the wafers during processing.
conductive platen
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
Wafer thickness
List or range of wafer thicknesses the tool can accept
300 .. 600 µm