The image is a colorized Scanning Electron Micrograph (SEM) of microstructure made using extremely short wavelength exposure techniques of a thick radiation sensitive polymer layer which was spun onto the substrate and developed after exposure to reveal an extraordinarily high aspect ratio microstructure. The central post (shown in orange) is hundreds of microns tall and only a few microns in diameter. The surrounding angular shaped structures are also a few microns wide, separated from one another by a few microns, and are also hundreds of microns tall. This structure was made through the MEMS and Nanotechnology Exchange fabrication network.