PRS-3000 Wet Bench |
|
|---|---|
| Alternate Name | Lift-Off Wet Bench |
| Manufacturer | SCP |
| Model | |
| Type | commercial |
| Equipment Characteristics | |
| Batch sizes | 100 mm: 25, 150 mm: 25, 75 mm: 25 |
| MOS clean | no |
| Wafer diameter(s) List or range of wafer diameters the tool can accept |
100 mm, 150 mm |
| Wafer geometry Types of wafers this equipment can accept |
1-flat, 2-flat, no-flat |
| Wafer holder Device that holds the wafers during processing. |
teflon carrier |
| Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
Pyrex (Corning 7740), silicon, indium phosphide, sapphire, PZT, quartz (single crystal), silicon carbide, gallium arsenide, quartz (fused silica) |