PDS 2010 |
|
|---|---|
| Model | 2010 |
| Type | commercial |
| Equipment Characteristics | |
| Batch sizes | 100 mm: 5, 50 mm: 7, 75 mm: 6 |
| MOS clean | yes |
| Wafer diameter(s) List or range of wafer diameters the tool can accept |
50 mm, 75 mm, 100 mm |
| Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
silicon on insulator, Borofloat (Schott), alumina, silicon, polycarbonate, gallium arsenide, Pyrex (Corning 7740), fused silica, indium phosphide |
| Wafer thickness List or range of wafer thicknesses the tool can accept |
100 .. 1000 µm |