Table Top RIE |
|
|---|---|
| Model | |
| Type | commercial |
| Equipment Characteristics | |
| Batch sizes | 100 mm: 4, 50 mm: 4, 75 mm: 4 |
| MOS clean | no |
| Wafer diameter(s) List or range of wafer diameters the tool can accept |
50 mm, 75 mm, 100 mm |
| Wafer geometry Types of wafers this equipment can accept |
1-flat, 2-flat, no-flat, notched |
| Wafer holder Device that holds the wafers during processing. |
aluminum plate |
| Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
alumina, ceramic, copper, glass (category), glass-ceramic, sapphire, silicon, silicon carbide, silicon germanium, silicon on insulator, silicon on sapphire, titanium |
| Wafer thickness List or range of wafer thicknesses the tool can accept |
100 .. 2500 µm |