Philips XL-30 ESEM

Model XL-30
Type commercial
  • The Philips XL-30 ESEM is a flexible scanning electron microscope with a large chamber. It can be used for conventional high vacuum imaging, or in the environmental mode, can be used to examine wet, oily, gassy or non-conducting samples. Samples can be examined in an atmosphere of up to 10 torr of water vapour, oxygen, nitrogen carbon dioxide or any other non-corrosice gas.
Equipment Characteristics
Batch sizes 100 mm: 1, 75 mm: 1
MOS clean no
Piece dimension
Range of wafer piece dimensions the equipment can accept
5 .. 100 mm
Piece geometry
Geometry of wafer pieces the equipment can accept
circular, irregular, other, rectangular, triangular shard
Piece thickness
Range of wafer piece thickness the equipment can accept
0 .. 1 cm
Wafer diameter(s)
List or range of wafer diameters the tool can accept
50 mm, 75 mm, 100 mm
Wafer geometry
Types of wafers this equipment can accept
1-flat, 2-flat, no-flat, notched
Wafer holder
Device that holds the wafers during processing.
aluminum plate
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
alumina, BK7, Borofloat (Schott), ceramic, copper, Corning 1737, Foturan (Schott), fused silica, gallium arsenide, gallium phosphide, germanium, glass (Hoya), glass-ceramic, indium phosphide, lithium niobate, other, Pyrex (Corning 7740), quartz (fused silica), quartz (single crystal), sapphire, silicon, silicon carbide, silicon germanium, silicon on insulator, silicon on sapphire, titanium
Wafer thickness
List or range of wafer thicknesses the tool can accept
0 .. 1 cm