The image is a colorized Scanning Electron Micrograph (SEM)
of microstructure made using extremely short wavelength
exposure techniques of a thick radiation sensitive polymer
layer which was spun onto the substrate and developed after
exposure to reveal an extraordinarily high aspect ratio
microstructure. The central post (shown in orange) is hundreds
of microns tall and only a few microns in diameter. The
surrounding angular shaped structures are also a few microns
wide, separated from one another by a few microns, and are
also hundreds of microns tall. This structure was made
through the MEMS and Nanotechnology Exchange fabrication network.
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