Ellipsometric Film Thickness Measurement |
|---|
|
| Film thickness |
0.01 .. 2 µm |
|---|
| Materials |
silicon nitride on silicon, silicon dioxide on silicon |
|---|
| Refractive index |
1 .. 4 |
|---|
| Wafer size |
|
|---|
| Equipment |
Rudolph ellipsometer |
| Equipment characteristics: |
| Batch sizes |
100 .. 150 mm: 1 |
|---|
| MOS clean |
yes |
|---|
| Wafer geometry Types of wafers this equipment can accept |
1-flat, 2-flat, notched, no-flat |
|---|
| Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
silicon on insulator, silicon |
|---|
| Wafer thickness List or range of wafer thicknesses the tool can accept |
300 .. 900 µm |
|---|
MEMS and Nanotechnology Exchange