Anti-stiction coating (Alkylhalosilanes): View

Anti-stiction coating (Alkylhalosilanes)

Deposition 20 Å

Material DDMS

Sides processed both

Temperature 25 °C

Thickness 20 Å

Wafer size

Equipment

Coater

The deposition apparatus is a prototype of a new commercial vapor phase deposition tool and can accommodate any sample/substrate size 200mm or smaller.

Equipment characteristics:

Batch sizes 100 mm: 1, 125 mm: 1, 150 mm: 1, 200 mm: 1, 50 mm: 5, 75 mm: 3

MOS clean no

Piece dimension

Range of wafer piece dimensions the equipment can accept

10 .. 200 mm

Piece geometry

Geometry of wafer pieces the equipment can accept

circular, irregular, other, rectangular, triangular shard

Piece thickness

Range of wafer piece thickness the equipment can accept

100 .. 10000 µm

Wafer geometry

Types of wafers this equipment can accept

1-flat, 2-flat, no-flat, notched

Wafer holder

Device that holds the wafers during processing.

aluminum chuck, anodized aluminum, flat chuck, plate, teflon

Wafer materials

List of wafer materials this tool can accept (not list of all materials, just the wafer itself).

alumina, BK7, Borofloat (Schott), ceramic, Corning 1737, Foturan (Schott), fused silica, gallium arsenide, gallium phosphide, glass (Hoya), glass-ceramic, indium phosphide, lithium niobate, other, Pyrex (Corning 7740), quartz (fused silica), quartz (single crystal), sapphire, silicon, silicon carbide, silicon germanium, silicon on insulator, silicon on sapphire, titanium

Wafer thickness

List or range of wafer thicknesses the tool can accept

100 .. 10000 µm

Comments:

AS1 (Anti-Stiction Coater) can deposit most Alkylhalosilane SAM films. (FDTS, FOTS, DDMS, etc.) Precursors for anti-stiction can be requested by users.
DDMS is our preferred anti-stiction coating for the following reasons:
1)Higher temperature stability
2)Short chain precursor
3)Better particle performance
4)Low surface energy.
Reference articles and information regarding dichlorodimethylsilane (DDMS) are available. The properties of the DDMS monolayer can be found in prior publications by the Maboudian Group, Dept of Chemical Engineering, UC
Berkeley.
Related References:
W. R. Ashurst, M. P. de Boer, C. Carraro and R. Maboudian "An Investigation of Sidewall Adhesion in MEMS", Applied Surface Science 212-213 pp. 735-741 (2003).
W. R. Ashurst, C. Carraro, W. Frey and R. Maboudian "Wafer Level Anti-Stiction Coatings for MEMS", Sensors and Actuators A 104, 213-221(2003).
Please contact us for samples.

Attachments

Ashurst-Dichlorodimethylsilane.pdf (478.7 KB, application/pdf): Reference Article
SPIE_paper.pdf (202.9 KB, application/pdf): Vapor Phase Anti-Stiction Description