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| Process characteristics: |
| Cuts per wafer Number of cuts per wafer |
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| Die separation (X-direction) The distance between cuts in X-direction. |
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| Die separation (Y-direction) The distance between cuts in Y-direction. |
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| Wafer size |
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| Equipment |
K&S 798 Automatic 8 inch wafer saw |
| Equipment characteristics: |
| Batch sizes |
25 .. 200 mm: 1 |
| MOS clean |
no |
| Wafer geometry Types of wafers this equipment can accept |
1-flat, 2-flat, no-flat, notched |
| Wafer holder Device that holds the wafers during processing. |
vacuum chuck |
| Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
fused silica, gallium arsenide, glass (category), Pyrex (Corning 7740), quartz (fused silica), quartz (single crystal), silicon, silicon on insulator |
| Wafer thickness List or range of wafer thicknesses the tool can accept |
50 .. 1000 µm |
| Comments: |
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