|
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| Process characteristics: |
| Second substrate side bonded |
|
|---|
| Substrate side bonded |
|
|---|
| Alignment tolerance Registration of CAD data to features on wafer |
5 µm |
|---|
| Alignment type Method used to align materials to be bonded. |
optical |
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| Batch size |
2 |
|---|
| Process duration |
30 min |
|---|
| Second substrate diameters |
100 mm |
|---|
| Second substrate geometry |
wafer |
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| Second substrate material |
silicon |
|---|
| Second substrate thickness |
400 .. 1000 µm |
|---|
| Temperature |
1100 °C |
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| Wafer holder Device that holds the wafers during processing. |
aluminum chuck |
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| Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
silicon |
|---|
| Wafer size |
|
|---|
| Equipment |
Karl Suss Bond aligner
|
| Equipment characteristics: |
| MOS clean |
no |
|---|
| Wafer geometry Types of wafers this equipment can accept |
1-flat, 2-flat |
|---|
| Wafer thickness List or range of wafer thicknesses the tool can accept |
300 .. 600 µm |
|---|
| Comments: |
|
MEMS and Nanotechnology Exchange