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Photoresist Blue M Pre- & Post-Bake: View
Process Hierarchy
Bonding
Clean
Consulting
Deposition
Doping
Etch
LIGA
Lift off
Lithography
Mask making
Metrology
Miscellaneous
Packaging
Polishing
Process technologies
Thermal
   Anneal
   Bake
   Oxidation
Unique capabilities

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368

Photoresist Blue M Pre- & Post-Bake
Process characteristics:
Temperature
95...150
Temperature
95...150
unconstrained
Excluded materials gold
Material photoresist (category)
Wafer size
Wafer size
Equipment Blue M Bake Oven
Equipment characteristics:
Batch sizes 100 mm: 4, 150 mm: 3, 50 mm: 4, 75 mm: 4
Wafer geometry
Types of wafers this equipment can accept
1-flat, 2-flat, no-flat, notched
Wafer holder
Device that holds the wafers during processing.
stainless steel
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
silicon, silicon on insulator
Wafer thickness
List or range of wafer thicknesses the tool can accept
200 .. 800 µm
Comments:
  • No Gold Allowed in oven.