logo
Microwave bonding: View
Process Hierarchy
Bonding
   Anodic bonding
   Fusion bonding
   Glass frit bonding
   Miscellaneous bonding
Clean
Consulting
Deposition
Doping
Etch
LIGA
Lift off
Lithography
Mask making
Metrology
Miscellaneous
Packaging
Polishing
Process technologies
Thermal
Unique capabilities
   DUV Lithography
   Deep boron diffusion
   Hot Embossing
   LIGA
   Maskless lithography
   Microwave bonding
   Shape memory alloy deposition
   Silicon-germanium processes
   Supercritical dry
   Xenon difluoride etch

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368

Microwave bonding
Process characteristics:
1st bonded material
Specify first material in bonded pair.
1st bonded material
Specify first material in bonded pair.
2nd bonded material
Specify second material in bonded pair.
2nd bonded material
Specify second material in bonded pair.
Alignment tolerance
Tolerance of alignment if needed.
Alignment tolerance
Tolerance of alignment if needed.
unconstrained
Alignment type
Method used to align materials to be bonded.
Alignment type
Method used to align materials to be bonded.
Ambient
Preferred bonding environment (if known).
Ambient
Available  
Selected
Preferred bonding environment (if known).
Bond strength
Required strength of bond (if known).
Bond strength
Required strength of bond (if known).
unconstrained
Contact force
Preferred contact force applied when bonding materials (if known).
Contact force
Preferred contact force applied when bonding materials (if known).
unconstrained
Temperature
Preferred bonding temperature (if known).
Temperature
Preferred bonding temperature (if known).
unconstrained
Equipment