Solvent clean (acetone +IPA) |
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|
| Batch size |
1 |
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| Cleaning agents |
acetone, IPA |
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| Process duration |
10 min |
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| Sides processed |
both |
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| Temperature |
22 °C |
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| Wafer size |
|
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| Equipment |
Solvent wet bench |
| Equipment characteristics: |
| Wafer holder Device that holds the wafers during processing. |
teflon carrier |
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| Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
silicon, glass (category) |
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| Wafer thickness List or range of wafer thicknesses the tool can accept |
200 .. 800 µm |
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MEMS and Nanotechnology Exchange